s Multi-elemental Ion Implanter

Multi-Elemental Ion Implanter

The Laboratory for Ion Implantation of the University of Torino "LIUTo" is equipped with a state-of-the-art multi-elemental ion implanter funded within the framework of the "Departments of Excellence" program (L. 232/2016) funded by the Italian Ministry of Education, University and Research (MIUR).


The principal technical characteristics of the apparatus are summarized as follows:
  • max terminal potential: 100 kV
  • ion source: NEC - SNICS II
  • ion species tested so far: H, C, O, Mg, Si, MnO, Pb, Sn
  • beamlines: 0o (currently operational) , 20o (currently not operational)
  • typical ion beam current range: 10-12 - 10-6 A (depending upon ion type and charge state)
  • typical ion beam size: 1 cm2 (depending upon ion species and charge state)
  • irradiation chamber: localized within the cleanroom facility
  • radiation safety: Radiation protection in all regards is ensured by University Torino.
The facility is designed to operate within the following applicative frameworks:
  • materials modification: tribology, optical effects
  • devices functional characterization: IBIC
  • quantum technologies: controlled implantation (down to the single ion level) of specific impurities for the engineering of optically active defects in wide bandgap materials; for further information, see this link of the "Diamond Research" page of our site and this link about the relevant quantum-optical characterization techniques;
  • semiconductor processing
The access to the facility is controlled under the current national laws regulating radio-protection.
If you are interested in further exploring this experimental capabilities of this facility, please contact Ettore Vittone.